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- Silicon Ingot

Large size and high purity single crystal products made of Czochralski Method are mainly used as very key materials for plasma etcher in IC chip manufacturing. We can provide silicon ingots with different sizes and resistivity to meet customer requirements.
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Product Description
Large size and high purity single crystal products made of Czochralski Method are mainly used as very key materials for plasma etcher in IC chip manufacturing. We can provide silicon ingots with different sizes and resistivity to meet customer requirements.
 

Product Application
Raw material for making cathode and focus ring of plasma etcher.


Technical Parameters

Diameter/mm Type/Orientation Purity

Electrical Resistivity(Ω.cm)

Length

φ200-φ580

P/<100>/<111>

10~11N

≤0.02

Customer Spec

1-4

60-90 etc.

Customer Spec
We could not find any corresponding parameters, please add them to the properties table
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